{"id":113,"date":"2008-02-27T10:58:45","date_gmt":"2008-02-27T16:58:45","guid":{"rendered":""},"modified":"-0001-11-30T00:00:00","modified_gmt":"-0001-11-30T05:00:00","slug":"","status":"publish","type":"post","link":"https:\/\/lithoguru.com\/life\/?p=113","title":{"rendered":"The SPIE Advanced Lithography Symposium \u2013 Day 2"},"content":{"rendered":"<p>This was a day of full technical meetings.  In the morning I sat in on the optical lithography conference where I saw better-than-expected progress on double patterning.  I was particularly impressed with the quality of the litho \u201cfreeze\u201d images.  In the afternoon I sat in on the resist conference, where I was particularly unimpressed with the lack of progress in the understanding of line edge roughness.  This is not a good sign.<\/p>\n<p>I didn\u2019t attend the EUV session of the emerging conference, though I saw the crowd of people flowing out of the door.  Several people asked me what I thought of the AMD\/ASML\/IBM paper showing a working device with a layer made using EUV lithography.  Since I didn\u2019t see the paper, I couldn\u2019t comment on it, though I was immediately reminded of a paper I saw many years ago, where IBM demonstrated a device with one critical layer imaged with proximity X-ray lithography.  Shortly after that device demonstration, IBM canceled their X-ray program.<\/p>\n<p>In the early evening, there was a panel discussion  called \u201cFuture Projection Lithography: Optical or EUV?\u201d  Since I already knew the answer, I skipped the panel and went straight to the hospitality suites.<\/p>\n<p>The hospitality suite scene seemed subdued this year.  Everything was low-key (and occasionally dead) at normally hoping parties.  Still, it was nice to wander around and socialize \u2013 one of the key benefits of this symposium.  I ended the evening at the KLA-Tencor \u201cbathtub\u201d party put on by the PROLITH team.  Good times, and good memories evoked.  Packing it in at 11pm, I tried not to think of the 7am breakfast meeting I had scheduled for the next day \u2013 that\u2019s life at SPIE.<\/p>\n","protected":false},"excerpt":{"rendered":"<p>This was a day of full technical meetings. In the morning I sat in on the optical lithography conference where I saw better-than-expected progress on double patterning. I was particularly impressed with the quality of the litho \u201cfreeze\u201d images. In the afternoon I sat in on the resist conference, where I was particularly unimpressed with [&hellip;]<\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"open","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[2],"tags":[],"class_list":["post-113","post","type-post","status-publish","format-standard","hentry","category-microlithography"],"_links":{"self":[{"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=\/wp\/v2\/posts\/113","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=%2Fwp%2Fv2%2Fcomments&post=113"}],"version-history":[{"count":0,"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=\/wp\/v2\/posts\/113\/revisions"}],"wp:attachment":[{"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=%2Fwp%2Fv2%2Fmedia&parent=113"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=%2Fwp%2Fv2%2Fcategories&post=113"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=%2Fwp%2Fv2%2Ftags&post=113"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}