{"id":437,"date":"2015-03-10T14:34:16","date_gmt":"2015-03-10T19:34:16","guid":{"rendered":"http:\/\/life.lithoguru.com\/?p=437"},"modified":"2015-03-10T14:34:16","modified_gmt":"2015-03-10T19:34:16","slug":"awards-from-the-spie-advanced-lithography-symposium","status":"publish","type":"post","link":"https:\/\/lithoguru.com\/life\/?p=437","title":{"rendered":"Awards from the SPIE Advanced Lithography Symposium"},"content":{"rendered":"

Here is a recap of the various people who were recognized with awards at this year\u2019s SPIE Advanced Lithography Symposium. (photos by SPIE, http:\/\/spie.org\/x112637.xml)<\/p>\n

Career Achievement Award<\/strong>
\nAndy Neureuther and Bill Oldham were acknowledged for their \u201ccareer long contribution to the art and science of lithography.\u201d The award was made \u201cin deep appreciation for your 40 years of visionary guidance and dedication to SPIE society and lithography community.\u201d<\/p>\n

\"award1\"<\/a><\/p>\n

12th Frits Zernike Award<\/strong>
\nRalph Dammel, CTO of AZ Electronic Materials<\/p>\n

\"award2\"<\/a><\/p>\n

Fellows of SPIE<\/strong>
\nLuigi Capodieci, Bernd Geh, Moshe Preil, Masato Shibuya, and Obert Wood<\/p>\n

\"award3\"<\/a><\/p>\n

From the Metrology conference<\/strong>:
\nDiana Nyyssonen Award for Best Paper in Metrology (2014 conference):
\n\u201c10nm three-dimensional CD-SEM metrology\u201d, Andr\u00e1s E. Vlad\u00e1r, John S. Villarrubia, Jasmeet S. Chawla, et al.,<\/p>\n

Karel Urbanek Award for Best Student Paper (student lead author at this year\u2019s conference):
\n\u201cMechanical and thermal properties of nanomaterials at sub-50nm dimensions characterized using coherent EUV beams\u201d, Kathleen M. Hoogeboom-Pot, Jorge N. Hernandez-Charpak, Travis Frazer, Xiaokun Gu, Emrah Turgut, Univ. of Colorado at Boulder; Erik H. Anderson, Weilun L. Chao, Lawrence Berkeley National Lab.; Justin M. Shaw, National Institute of Standards and Technology; Ronggui Yang, Margaret M. Murnane, Henry C. Kapteyn, Damiano Nardi, Univ. of Colorado at Boulder<\/p>\n

From the Patterning Materials conference<\/strong>:
\nC. Grant Willson Best Paper Award (2014 conference):
\n\u201cEUV Resists based on Tin-Oxo Clusters\u201d, Brian Cardineau, Ryan Del Re, Hashim Al-Mashat, Miles Marnell, Michaela Vockenhuber, Yasin Ekinci, Chandra Sarma, Mark Neisser, Daniel A. Freedman, and Robert L. Brainard<\/p>\n

Hiroshi Ito Memorial Award for the Best Student Paper (2014 conference):
\n\u201cAn insitu hard mask block copolymer approach for the fabrication of ordered, large scale, horizontally aligned, Si nanowire arrays on Si substrate\u201d, Tandra Ghoshal, Ramsankar Senthamaraikannan, Matthew T. Shaw, Justin D. Holmes and Michael A. Morris<\/p>\n

Jeffrey Byers Memorial Best Poster Award (2015 conference):
\n\u201cEUV Resists Comprised of Main Group Organometallic Oligomeric Materials\u201d, James Passarelli, Brian Cardineau, Ryan Del Re, Miriam Sortland, Michaela Vockenhuber, Yasin Ekinci, Chandra Sarma, Mark Neisser, Daniel A. Freedman, and Robert L. Brainard<\/p>\n

From the Design Process Technology Co-Optimization conference<\/strong>:
\nFirst Annual Franco Cerrina Memorial Best Student Paper Award\u00a0(2015 conference):
\n\u201cToplogy and context-based pattern extraction using line-segment Voronoi diagram\u201d, Sandeep K. Dey, Univ. della Svizzera Italiana (Switzerland)<\/p>\n

From the Optical Lithography conference<\/strong>:
\nCymer Best Student Paper Award (2015 conference):
\n\u201cCharacterizing the dependence of thick-mask edge effects on feature size and illumination angle using AIMS images\u201d Aamod Shanker, Andrew R. Neureuther, Laura Waller, Univ. of California, Berkeley; Martin Sczyrba, Advanced Mask Technology Ctr.; Brid Connolly, Toppan Photomasks<\/p>\n","protected":false},"excerpt":{"rendered":"

Here is a recap of the various people who were recognized with awards at this year\u2019s SPIE Advanced Lithography Symposium. (photos by SPIE, http:\/\/spie.org\/x112637.xml) Career Achievement Award Andy Neureuther and Bill Oldham were acknowledged for their \u201ccareer long contribution to the art and science of lithography.\u201d The award was made \u201cin deep appreciation for your […]<\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[1],"tags":[],"class_list":["post-437","post","type-post","status-publish","format-standard","hentry","category-general"],"_links":{"self":[{"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=\/wp\/v2\/posts\/437","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=%2Fwp%2Fv2%2Fcomments&post=437"}],"version-history":[{"count":1,"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=\/wp\/v2\/posts\/437\/revisions"}],"predecessor-version":[{"id":443,"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=\/wp\/v2\/posts\/437\/revisions\/443"}],"wp:attachment":[{"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=%2Fwp%2Fv2%2Fmedia&parent=437"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=%2Fwp%2Fv2%2Fcategories&post=437"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=%2Fwp%2Fv2%2Ftags&post=437"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}