{"id":516,"date":"2017-02-28T07:13:28","date_gmt":"2017-02-28T13:13:28","guid":{"rendered":"http:\/\/life.lithoguru.com\/?p=516"},"modified":"2017-02-28T07:13:28","modified_gmt":"2017-02-28T13:13:28","slug":"spie-advanced-lithography-symposium-2017-day-1","status":"publish","type":"post","link":"https:\/\/lithoguru.com\/life\/?p=516","title":{"rendered":"SPIE Advanced Lithography Symposium 2017 \u2013 day 1"},"content":{"rendered":"

The first day of the symposium began with the awards.\u00a0 I was very happy to see a great group of new SPIE fellows from our community:\u00a0 Emily Gallagher of Imec, Yuri Granik of Mentor Graphics, Qinghuang Lin of IMB, David Pan of the University of Texas at Austin, Mark Phillips of Intel, and James Thackeray of Dow.\u00a0 Congratulations to each of you for this well-deserved recognition.\u00a0 Donis Flagello, CEO of Nikon Research Corporation of America, won this year\u2019s Frits Zernike award (full disclosure, I nominated him).\u00a0 For a history of the Zernike award, see this brief article<\/a>.<\/p>\n

For a change, I enjoyed all three plenary speakers.\u00a0 Usually, at least one is a dud, but not this year.\u00a0 I have to admit that I didn\u2019t care for JSR CEO Nobu Koshiba\u2019s disciple-like references to Ray Kurzweil and his singularity predictions (I\u2019m not a Kurzweil fan), but it was just one part of his overall optimism for Moore\u2019s Law.\u00a0 I don\u2019t agree that Moore\u2019s Law will continue to the 2-nm node, but I guess it\u2019s important that sufficient optimism exists, otherwise we\u2019ll never try.\u00a0 And we should try.<\/p>\n

The first two talks of the EUV session were keynote addresses.\u00a0 Britt Turkot of Intel painted a fairly rosy picture of the progress of EUVL towards manufacturing readiness.\u00a0 \u201cIt\u2019s been a long and winding road,\u201d and we still have a ways to go, but the eight NXE:3300s and six NXE:3350s in the field are giving semiconductor manufacturers opportunities to shake out enough of the reliability problems to enable process learning.\u00a0 Tool availability continues to creep up (past the 70% mark), and mask making has progressed to the point where Intel has made \u201cmultiple\u201d defect-free EUV masks.\u00a0 Intel showed data on \u201cadders\u201d (defects that get added to the mask during use) and reiterated their message from last year that that production without a pellicle is not an option.\u00a0 Thus, it makes sense that she listed the availability of a manufacturing-capable pellicle as the biggest risk.<\/p>\n

She also mentioned stochastics, saying that \u201cCD and edge placement variability is a deal breaker.\u201d\u00a0 But then her conclusion slide said that resist performance won\u2019t gate the introduction of EUV.\u00a0 I didn\u2019t know what to make of these mixed messages, especially when she explained that the target dose for EUV manufacturing was 20 mJ\/cm2. \u00a0 At that dose, there will be plenty of CD and edge placement variability.<\/p>\n

Seong-Sue Kim of Samsung was similarly encouraged by EUVL improvement. \u00a0He expressed amazement at the progress in mask blank defectivity saying it had reached the benchmark of 5 defects per blank that he thinks can enable manufacturing.\u00a0 He also said that the mask blistering problems he mentioned last year have largely been solved.\u00a0 For resists, he thinks that current performance is good enough for 7nm development, but sensitivity (at low roughness) needs to be improved for production.\u00a0 Of course, everyone agrees with that statement.\u00a0 The question is how to do it.<\/p>\n

My favorite technical talk was Bill Hinsberg\u2019s modeling of metal-oxide resists \u2013 a much needed start.\u00a0 John Biafore gave a great paper modeling millions of contact holes at various EUV conditions and looking for stochastic-related failures.\u00a0 He expressed skepticism at any possible breaking of the RLS trade-off (\u201cresolution, LER, sensitivity \u2013 pick two\u201d).<\/p>\n

Finally, I was extremely gratified by the reception I received to my tutorial talk and was grateful for the many people willing to stay till 6:30pm to hear me speak.\u00a0 Thanks to Eric Panning and Ken Goldberg and the EUV Lithography conference for giving me such a great opportunity to talk about stochastic-induced roughness.<\/p>\n","protected":false},"excerpt":{"rendered":"

The first day of the symposium began with the awards.\u00a0 I was very happy to see a great group of new SPIE fellows from our community:\u00a0 Emily Gallagher of Imec, Yuri Granik of Mentor Graphics, Qinghuang Lin of IMB, David Pan of the University of Texas at Austin, Mark Phillips of Intel, and James Thackeray […]<\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[1],"tags":[],"class_list":["post-516","post","type-post","status-publish","format-standard","hentry","category-general"],"_links":{"self":[{"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=\/wp\/v2\/posts\/516","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=%2Fwp%2Fv2%2Fcomments&post=516"}],"version-history":[{"count":1,"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=\/wp\/v2\/posts\/516\/revisions"}],"predecessor-version":[{"id":517,"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=\/wp\/v2\/posts\/516\/revisions\/517"}],"wp:attachment":[{"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=%2Fwp%2Fv2%2Fmedia&parent=516"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=%2Fwp%2Fv2%2Fcategories&post=516"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=%2Fwp%2Fv2%2Ftags&post=516"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}