{"id":614,"date":"2020-02-25T07:26:50","date_gmt":"2020-02-25T13:26:50","guid":{"rendered":"http:\/\/life.lithoguru.com\/?p=614"},"modified":"2020-02-25T07:26:50","modified_gmt":"2020-02-25T13:26:50","slug":"spie-advanced-lithography-symposium-2020-day-1","status":"publish","type":"post","link":"https:\/\/lithoguru.com\/life\/?p=614","title":{"rendered":"SPIE Advanced Lithography Symposium 2020 \u2013 day 1"},"content":{"rendered":"\n<p>The plenary session\nbegan with opening remarks and awards.&nbsp;\nWe welcomed two new Fellows of SPIE:&nbsp;\nHiroshi Fukuda and Mike Rieger.&nbsp;\nCongratulations for that well-deserved recognition.&nbsp; This year\u2019s <a href=\"https:\/\/spie.org\/news\/winfried-kaiser-2020-spie-frits-zernike-award-for-microlithography\">Frits\nZernike Award for Microlithography<\/a> was given to Winfried Kaiser of Zeiss\nfor his major contributions to 193nm and EUV optics.&nbsp; He also gets my nomination for most dapper\nZernike award winner!&nbsp; Three good plenary\ntalks (on machine learning, in-memory computing, and Flash memory process\ntechnology) were full of interesting technical information (so long as you\nignored the commercial embedded in the Kioxia talk).<\/p>\n\n\n\n<p>The opening keynote talk for the EUV conference was given by Charlie Wallace of Intel, where he described not just the current status of EUV lithography for manufacturing 32 nm pitch lines and spaces, but the immense challenges of shrinking the pitch to 30 nm or 28 nm.\u00a0 As pitch shrinks, higher doses are required, but even at these high doses defect rates are too high.\u00a0 Some quotes:\u00a0 \u201cIt is execution time for EUV lithography.\u201d\u00a0 \u201cWe need fundamental improvement in EUV materials\u201d.\u00a0 \u201cImprovement in metrology is required.\u201d\u00a0 <\/p>\n\n\n\n<p>A quick pause to\ntalk about Intel.&nbsp; Anyone who has read\nthis blog over the last several years knows that I have complained about the paucity\nof semiconductor-maker talks at this and other lithography conferences, and\nespecially about how few talks Intel would give.&nbsp; I must now recognize that this criticism\nbelongs to the past. &nbsp;Intel has really\nstepped up their game recently, and they have seven presentations at AL this\nyear.&nbsp; Thank you, Intel!&nbsp; The entire lithography community appreciates\nyour contribution.<\/p>\n\n\n\n<p>The Metrology conference opened with an interesting experiment \u2013 the first keynote was given remotely.\u00a0 Alain Diebold of SUNY Polytechnique called in and spoke while his slides were advanced onsite.\u00a0 While not ideal, it was much better than a cancelled talk and I appreciate the conference chairs thinking experimentally about how to let the talk go on.\u00a0 Several afternoon talks covered the important topic of edge placement errors and how to characterize them using contour-based metrology rather than the traditional CD-based measurements.\u00a0 It is clear that this approach is quickly becoming a standard method.\u00a0 In the EUV session, Marie Krysak of Intel showed again how standard \u201cthree-sigma\u201d characterization of stochastic contact hole variations was not good enough to predict chip yield.\u00a0 She used a combination of non-Gaussian extrapolation and stress tests (underexposing to make the defect rates high enough to measure), both of which produced similar results when comparing the performance of different EUV resists.<\/p>\n\n\n\n<p>Some news:\u00a0 Canon and (at the very last minute) Qoniac have cancelled their hospitality events.\u00a0 I still managed to stay out too late and drink too much beer (thank you Fractilia and Inpria).<\/p>\n","protected":false},"excerpt":{"rendered":"<p>The plenary session began with opening remarks and awards.&nbsp; We welcomed two new Fellows of SPIE:&nbsp; Hiroshi Fukuda and Mike Rieger.&nbsp; Congratulations for that well-deserved recognition.&nbsp; This year\u2019s Frits Zernike Award for Microlithography was given to Winfried Kaiser of Zeiss for his major contributions to 193nm and EUV optics.&nbsp; He also gets my nomination for [&hellip;]<\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[2],"tags":[],"class_list":["post-614","post","type-post","status-publish","format-standard","hentry","category-microlithography"],"_links":{"self":[{"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=\/wp\/v2\/posts\/614","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=%2Fwp%2Fv2%2Fcomments&post=614"}],"version-history":[{"count":1,"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=\/wp\/v2\/posts\/614\/revisions"}],"predecessor-version":[{"id":615,"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=\/wp\/v2\/posts\/614\/revisions\/615"}],"wp:attachment":[{"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=%2Fwp%2Fv2%2Fmedia&parent=614"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=%2Fwp%2Fv2%2Fcategories&post=614"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/lithoguru.com\/life\/index.php?rest_route=%2Fwp%2Fv2%2Ftags&post=614"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}