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For fifteen years I wrote a quarterly column in the magazine Microlithography World (MLW) called The Lithography Tutor. (The column was renamed in The Lithography Expert in the fourth year for purely marketing reasons, but I still refer to it as my "tutor" columns.) The demise of MLW put an end to these columns, but they served a very important purpose for me: they become the nucleus of my textbook Fundamental Principles of Optical Lithography. So while the texbook contains almost all the information in the first 59 columns (in a more complete, updated, coherent, and organized fashion), here are the original columns for anyone who wants them. Lithography in bite-sized chunks.
Tutor 1 (January 1993, pp. 27-28), The Formation of an Aerial Image
Tutor 2 (April 1993, pp. 25-27), The Formation of an Aerial Image, part 2
Tutor 3 (July 1993, pp. 23-24), The Formation of an Aerial Image, part 3
Tutor 4 (October 1993, pp. 17-18), The Formation of an Aerial Image, part 4
Tutor 5 (Winter 1994, pp. 21-23), Positive Photoresists - Exposure
Tutor 6 (Spring 1994, pp. 22-24), Standing Waves in Photoresist
Tutor 7 (Summer 1994, pp. 23-25), Swing Curves
Tutor 8 (Autumn 1994, pp. 22-24), Photoresist Development
Tutor 9 (Winter 1995, pp. 24-26), Photoresist Development (Cont.)
Tutor 10 (Spring 1995, pp. 20-21), Depth of Focus
Tutor 11 (Autumn 1995, pp. 23-24), Depth of Focus, part 2
Tutor 12 (Winter 1996, pp. 24-25), Optimizing Numerical Aperture and Partial Coherence
(Note: the column was renamed “The Lithography Expert” starting Spring 1996)
Tutor 13 (Spring 1996, pp. 22-23), Optical Proximity Effects
Tutor 14 (Summer 1996, pp. 20-21, 28), Optical Proximity Effects, part 2
Tutor 15 (Autumn 1996, pp. 23-24), Optical Proximity Effects, part 3
Tutor 16 (Winter 1997, pp. 16-17), Resolution
Tutor 17 (Spring 1997, pp. 21-22), Lithography on Reflective Substrates
Tutor 18 (Summer 1997, pp. 29-30), Antireflective Coatings
Tutor 19 (Autumn 1997, pp. 21-22), Effect of Numerical Aperture and Partial Coherence on Swing Curves
Tutor 20 (Winter 1998, pp. 18-20), Swing Curves and the Process Window
Tutor 21 (Spring 1998, pp. 18-20), Isofocal Bias
Tutor 22 (Summer 1998, pp. 23-24), Pitch: The Other Resolution
Tutor 23 (Autumn 1998), The Natural Resolution
Tutor 24 (Winter 1999, pp. 11-12), Mask Linearity and the Mask Error Enhancement Factor
Tutor 25 (Spring 1999, pp. 20-21), Absorption and Reflectivity: Designing the Right Photoresist
Tutor 26 (Summer 1999, pp. 16-17), Specifying and Measuring Photomask Critical Dimensions
Tutor 27 (Autumn 1999, pp. 18-20), More on the Mask Error Enhancement Factor
Tutor 28 (Winter 2000, pp. 21-23), Impact of Resist on the Mask Error Enhancement Factor
Tutor 29 (Spring 2000, pp. 25-26), Line End Shortening
Tutor 30 (Summer 2000, pp. 26-28), Corner Rounding and Round Contacts
Tutor 31 (Autumn 2000, pp. 25, 30), Line End Shortening, Part 2
Tutor 32 (Winter, 2001), Using the Normalized Image Log-Slope
Tutor 33 (Spring, 2001), Using the Normalized Image Log-Slope, part 2
Tutor 34 (Summer, 2001), Using the Normalized Image Log-Slope, part 3
Tutor 35 (Fall, 2001), Using the Normalized Image Log-Slope, part 4
Tutor 36 (Winter, 2002), Using the Normalized Image Log-Slope, part 5
Tutor 37 (May, 2002), Using the Normalized Image Log-Slope, part 6
Tutor 38 (August, 2002), Process Settings and Process Latitude
Tutor 39 (November, 2002), The Impact of Phase Errors on Phase Shifting Masks
Tutor 40 (February, 2003), The Impact of Phase Errors on Phase Shifting Masks, part 2
Tutor 41 (May, 2003), Resolution Enhancement Technologies
Tutor 42 (August, 2003), Off-Axis Illumination
Tutor 43 (November, 2003), Scattering Bars
Tutor 44 (February, 2004), The Rayleigh Depth of Focus
Tutor 45 (May, 2004), Immersion Lithography
Tutor 46 (August, 2004), The Impact of Phase Errors on Phase Shifting Masks, part 3
Tutor 47 (November, 2004), Depth of Focus and the Alternating Phase Shift Mask
Tutor 48 (February, 2005), Designing a Bottom Antireflection Coating
Tutor 49 (May, 2005), Bottom Antireflection Coatings for High Numerical Aperture Imaging
Tutor 50 (August, 2005), The Death of the Aerial Image
Tutor 51 (November, 2005), Horizontal-Vertical (H-V) Bias
Tutor 52 (February, 2006), Horizontal-Vertical (H-V) Bias, part 2
Tutor 53 (May, 2006), Diffusion and Resolution
Tutor 54 (August, 2006), Diffusion and Resolution for Chemically Amplified Resists
Tutor 55 (November, 2006), Pattern Collapse
Tutor 56 (February, 2007), Line Edge Roughness, part 1
Tutor 57 (May, 2007), Line Edge Roughness, part 2
Tutor 58 (August, 2007), Line Edge Roughness, part 3
Tutor 59 (November, 2007), Optical Behavior of Pellicles
Tutor 60 (February, 2008), Focus Averaging
Tutor 61 (May, 2008), Mask Specifications: It’s not getting any easier
Tutor 62 (August, 2008), Measuring Line Edge Roughness: Fluctuations in Uncertainty
Tutor 63 (November, 2008), Proximity Distance
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