Chris's Recent Papers and Talks on Lithography

From the 2016 SPIE Advanced Lithography Symposium, here are both the papers and a recording of the presentations:

“Improvements to the Analytical Linescan Model for SEM Metrology”:    paper    presentation

“Modeling Metrology for Calibration of OPC Models”:    paper    presentation

From a Panel Discussion: "What Metrology Means to Me": presentation

 

From the 2015 SPIE Advanced Lithography Symposium, here are both the papers and a recording of the presentations:

"More systematic errors in the measurement of power spectral density":     paper     presentation

"Understanding the efficacy of linewidth roughness post-processing":     paper     presentation

"Analytical Linescan Model for SEM Metrology":     paper     presentation

 

A few recent presentations (click on the titles for a pdf version of the powerpoints):

  1. Chris A. Mack, “The future of lithography and its impact on design”, presented at the SPIE Advanced Lithography Conference, February 27, 2013.
  2. Chris A. Mack, "Line-Edge Roughness and the Ultimate Limits of Lithography", presented at the SPIE Advanced Lithography Conference, February, 2012.

 

The papers listed below are available (in PDF format) by clicking on the titles.

  1. Gian F. Lorusso, Vito Rutigliani, Frieda Van Roey, and Chris A. Mack, “Unbiased Roughness Measurements: Subtracting out SEM Effects, part 2”, Journal of Vacuum Science & Technology B, 36, 06J503 (2018).
  2. Gian Francesco Lorusso, Takumichi Sutani, Vito Rutigliani, Frieda van Roey, Alain Moussa, Anne-Laure Charley, Chris Mack, Patrick Naulleau, Chami Perera, Vassilios Constantoudis, Masami Ikota, Toru Ishimoto, Shunsuke Koshihara, “Need for LWR metrology standardization: the imec roughness protocol”, Journal of Micro/Nanolithography, MEMS, and MOEMS, 17(4), 041009 (2018).
  3. Chris A. Mack, “Reducing roughness in extreme ultraviolet lithography”, Journal of Micro/Nanolithography, MEMS, and MOEMS, 17(4), 041006 (2018).
  4. Chris A. Mack, “Shot noise: a 100-year history, with applications to lithography”, Journal of Micro/Nanolithography, MEMS, and MOEMS, 17(4), 041002 (2018).
  5. Gregory Blachut, Stephen M. Sirard, Andrew Liang, Chris A. Mack, et al., "Evolution of roughness during the pattern transfer of high-chi, 10nm half-pitch, silicon-containing block copolymer structures", Advanced Etch Technology for Nanopatterning VII, Proc., SPIE Vol. 10589, 1058907 (2018).
  6. Charlotte Cutler, James W. Thackeray, Jason DeSisto, et al., "Roughness power spectral density as a function of resist parameters and its impact through process", Optical Microlithography XXXI, Proc., SPIE Vol. 10587, 1058707 (2018).
  7. Andrew Liang, Chris Mack, et al., "Unbiased roughness measurements: the key to better etch performance", Metrology, Inspection, and Process Control for Microlithography XXXII. Proc., SPIE Vol. 10585, 1058524 (2018).
  8. Vito Rutigliani, Gian Francesco Lorusso, Danilo De Simone, et al., "Setting up a proper power spectral density (PSD) and autocorrelation analysis for material and process characterization", Metrology, Inspection, and Process Control for Microlithography XXXII, Proc., SPIE Vol. 10585, 105851K (2018).
  9. Gian F. Lorusso, Vito Rutigliani, Frieda Van Roey, and Chris A. Mack, "Unbiased Roughness Measurements: Subtracting out SEM Effects", Microelectronic Engineering, 190, 33-37 (2018).
  10. Chris A. Mack, "Reducing Roughness in Extreme Ultraviolet Lithography", International Conference on Extreme Ultraviolet Lithography, Proc., SPIE Vol. 10450 (2017) p. 10450OP-1.
  11. Chris A. Mack and Benjamin D. Bunday, "Using the Analytical Linescan Model for SEM Metrology", Metrology, Inspection, and Process Control for Microlithography XXXI, Proc., SPIE Vol. 10145 (2017) p. 101451R.
  12. Chris A. Mack, Timothy A. Brunner, Xuemei Chen, and Lei Sun, "Level crossing methodology applied to line-edge roughness characterization", Metrology, Inspection, and Process Control for Microlithography XXXI, Proc., SPIE Vol. 10145 (2017) p. 101450Z.
  13. Barton Lane, Chris Mack, Nasim Eibagi, and Peter Ventzek, "Global minimization line-edge roughness analysis of top down SEM images", Metrology, Inspection, and Process Control for Microlithography XXXI, Proc., SPIE Vol. 10145 (2017) p. 101450Y.
  14. Michael Adel, et al., "Impact of stochastic process variations on overlay mark fidelity towards the 5nm node", Metrology, Inspection, and Process Control for Microlithography XXXI, Proc., SPIE Vol. 10145 (2017) p. 1014509.
  15. Timothy A. Brunner, Xuemei Chen, Allen Gabor, Craig Higgins, Lei Sun, and Chris A. Mack, "Line-edge roughness performance targets for EUV lithography", Extreme Ultraviolet (EUV) Lithography VIII, Proc., SPIE Vol. 10143 (2017) p. 101430E.
  16. Chris A. Mack, “Uncertainty in roughness measurements: putting error bars on line-edge roughness”, J. Micro/Nanolith. MEMS MOEMS, 16(1), 010501 (2017).
  17. Chris A. Mack, "Biases and uncertainties in the use of autocovariance and height–height covariance functions to characterize roughness", Journal of Vacuum Science & Technology B, Vol. 34, No. 6 (Nov/Dec, 2016) p. 06K701.
  18. Chris A. Mack and Benjamin D. Bunday, “Improvements to the Analytical Linescan Model for SEM Metrology”, Metrology, Inspection, and Process Control for Microlithography XXX, Proc., SPIE Vol. 9778 (2016).
  19. Chris A. Mack, Ananthan Raghunathan, John Sturtevant, Yunfei Deng, Christian Zuniga, Kostas Adam, “Modeling Metrology for Calibration of OPC Models”, Metrology, Inspection, and Process Control for Microlithography XXX, Proc., SPIE Vol. 9778 (2016).
  20. Chris A. Mack, “The Multiple Lives of Moore’s Law", IEEE Spectrum, pp. 30-37 (Apr. 2015).
  21. Chris A. Mack and Benjamin D. Bunday, "Analytical Linescan Model for SEM Metrology", Metrology, Inspection, and Process Control for Microlithography XXIX, Proc., SPIE Vol. 9424 (2015) p. 94240F.
  22. Chris A. Mack, "More systematic errors in the measurement of power spectral density", Journal of Micro/Nanolithography, MEMS, and MOEMS , Vol. 14, No. 3 (Jul-Sep, 2015) p. 033502.
  23. Chris A. Mack, "Understanding the efficacy of linewidth roughness post-processing", Journal of Micro/Nanolithography, MEMS, and MOEMS , Vol. 14, No. 3 (Jul-Sep, 2015) p. 033503.
  24. Chris A. Mack, "Line-Edge Roughness and the Impact of Stochastic Processes on Lithography Scaling for Moore’s Law", Photonic Innovations and Solutions for Complex Environments and Systems (PISCES) II, Proc., SPIE Vol. 9189, (2014) p. 91890D.
  25. Chris A. Mack, “Analytical Expression for Impact of Linewidth Roughness on Critical Dimension Uniformity”, Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 13, No. 2 (Apr-Jun, 2014) p. 020501.
  26. Benjamin D. Bunday and Chris A. Mack, "Influence of Metrology Error in Measurement of Line Edge Roughness Power Spectral Density", Metrology, Inspection, and Process Control for Microlithography XXVIII, Proc., SPIE Vol. 9050 (2014) p. 90500G.
  27. Siddharth Chauhan, et al., “Mesoscale modeling: a study of particle generation and line-edge roughness”, Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 13, No. 1 (Jan–Mar, 2014) p. 013012.
  28. Chris A. Mack, John J. Biafore, and Mark D. Smith, “Stochastic Exposure Kinetics of Extreme Utraviolet Photoresists: Trapping Model ”, Journal of Vacuum Science & Technology B, Vol. 31, No. 6 (Nov/Dec, 2013) p. 06F603-1.
  29. Chris A. Mack, “Defining and measuring development rates for a stochastic resist: a simulation study”, Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 12, No. 3 (Jul-Sep, 2013) p. 033006.
  30. Chris A. Mack, "Systematic Errors in the Measurement of Power Spectral Density", Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 12, No. 3 (Jul-Sep, 2013) p. 033016.
  31. Chris A. Mack, "Generating random rough edges, surfaces, and volumes", Applied Optics, Vol. 52, No. 7 (1 March 2013) pp. 1472-1480.
  32. Chris A. Mack, “Reaction-diffusion power spectral densityJournal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 11, No. 4 (Oct-Dec, 2012) p. 043007.
  33. Prateek Mehrotra, Chris A. Mack, Richard J. Blaikie, “A solid immersion interference lithography system for imaging ultra-high numerical apertures with high-aspect ratios in photoresist using resonant enhancement from effective gain media”, Optical Microlithography XX, Proc., SPIE Vol. 8326 (2012) p. 83260Z.
  34. Chris A. Mack, “Correlated surface roughening during photoresist development”, Advances in Resist Technology and Processing XXIX, Proc., SPIE Vol. 8325 (2012) p. 83250I.
  35. Chris A. Mack, “Defining and measuring development rates for a stochastic resist”, Advances in Resist Technology and Processing XXIX, Proc., SPIE Vol. 8325 (2012) p. 83251K.
  36. Chris. A. Mack, "Analytic form for the power spectral density in one, two, and three dimensions", Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 10, No. 4 (Oct-Dec, 2011) p. 040501.
  37. Chris A. Mack, James W. Thackeray, John J. Biafore, and Mark D. Smith, “Stochastic Exposure Kinetics of EUV Photoresists: A Simulation Study”, Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 10, No. 3 (Jul-Sep, 2011) p. 033019.
  38. Chris A. Mack, “Fifty Years of Moore’s Law”, IEEE Transactions On Semiconductor Manufacturing, Vol. 24, No. 2 (May, 2011) pp. 202-207.

 

For a complete collection of all of my papers: Technical papers (a complete list)

Back to the Publications Home ...