Last week Hiroshi Ito, co-inventor of the chemically amplified resist (along with C. Grant Willson and Jean Fréchet), passed away after a long illness. Dr. Ito was working as a post-doc under Grant Willson at IBM when they developed the concept and the first example of a chemically amplified photoresist in 1980, now the dominant technology for semiconductor manufacturing. Dr. Ito became an IBM fellow in 2008.
The following Obit ran in the San Jose Mercury News on July 7.
http://www.legacy.com/obitu…