At the beginning of this year, IEEE Spectrum asked me to write an article about double patterning for the general electrical engineering audience. Sounding like fun, I agreed. The editor then warned me to think about the process as a “collaborative” writing experience with the editors of the magazine. That has certainly proven to be true, since the final article bears little resemblance to the first draft I submitted in May. Still, the result, I think, serves the basic purpose of explaining to a general technical reader what is going on in advanced lithography and why.

The article is entitled “Seeing Double” and appeared in the November issue of IEEE Spectrum.