All posts by Chris

Day 3 – BACUS 2009

Day 3 is the last day of the conference this year. Due to significantly lower abstract submittals, the meeting was shortened by a day. After a set of fairly good papers in the morning, the afternoon was filled solely with a panel discussion (which I skipped in order to get home early).

Overall BACUS was a good conference, but it is definitely a shadow of its former self. Its not just that attendance was down (close to 600, versus something like 1000 each year during the middle of this decade), the energy level of the conference was down as well. It was worthwhile, but not exciting; fun but not one of the highlights of my year. Of course most of the malaise is due to the economy, but part is due to the state of the technology as well. EUVL is making progress, but any rational person has to be very skeptical of its eventual success. Double patterning receives too many complaints about cost, and especially mask costs (a sensitive topic at this conference), to be excited about it. Imprint will likely play important niche roles in manufacturing, but won’t save CMOS. Mapper is interesting, but may be too late to be a big player. Where does that leave us? Not having as much fun as we used to.

But moods can change quickly (like when everyone realized almost simultaneously that immersion lithography was real). We’ll see what happens this spring, where the only thing that is inevitable is a smaller Advanced Lithography conference in San Jose.

Day 2 – BACUS 2009

I began the second day with a four mile run on the beach, watching Venus and the crescent moon disappear as the sun rose behind the city of Monterey. Glorious. I ran with Charlie King, and had trouble keeping up with him. But then, he is so much younger than me.

Since I was way behind on finishing up the paper I had to give in the afternoon, I missed most of the morning talks. There were some very nice talks in the afternoon, but unfortunately mine was the only one on my favorite topic – line-edge roughness. My conclusion: mask writer-induced line-edge roughness cannot be ignored.

Best new product acronym: LAIPH – Luminescent Automated Image Processing Hub. The author pronounced it as “life” but it looks more like it should be pronounced “laugh”. It’s good to see that Luminescent is spending their money on engineering rather than marketing.

My broken record: I’m sorry to say that the lower number of papers at the conference has not resulted in a lower number of papers containing graphs with no numbers on the x and y axes. Why would someone show a graph in their presentation that contains absolutely no information? I don’t get it.

I enjoyed the dueling papers by KLA-Tencor and the German mask shop AMTC, where KLA showed that more measurement data was needed to know that a photomask was in spec, and the mask shop countered that less data was needed (their masks are just that good!). I found the KLA-Tencor paper (which used a non-KLA measurement tool, by the way) more convincing.

The day ended with the conference banquet, but with something missing. No entertainment. 2005 was the last year with true BACUS entertainment (skits and songs by industry insiders full of corny insider jokes). The demise of the entertainment is a long story – maybe I’ll tell it (from my perspective) someday. But I do miss it. If you have never seen it, or want to be reminded of it, check out these pictures from the days when I was a part of the cast.

Day 1 – BACUS 2009

It’s great to be back in Monterey! I’m at the 29th annual BACUS Photomask Technology Conference. This is its 10th year in Monterey, and unfortunately I’ve missed the last few years due to teaching commitments at UT. But I’m not teaching this fall, so I couldn’t pass on this one.

Monterey, California will always be a special place for me. I met my wife for the first time here seven years ago. And we got married in Monterey 15 months later. A beautiful town during a beautiful time of year. Oh yes, and the conference is usually a good one as well.

[Aside: BACUS is not a reference to the god of wine, despite the amount of that liquid consumed at the poster session each year. It is an antiquated acronym standing for the Bay Area Chrome Users Society – something I’ll bet that a majority of conference attendees don’t know.]

The day began with Mike Polcari, CEO of SEMATECH, giving the keynote address. He gave the standard compelling argument for collaborative research, and the standard not-so-compelling argument for EUV lithography. My favorite quote: “EUV is inevitable”. It reminds me of Mr. Smith from the movie The Matrix saying “Do you hear that? That is the sound of inevitability.” Surreal.

There was an abundance of papers coupling simulation with high resolution mask inspection images to automatically predict defect printability. I remember working on this eight years ago with Intel, back when nobody else would listen to the idea. Patience is a virtue. It could also be that every struggling OPC company with an aerial image model is desperately looking for a product that might sell.

Attendance at the conference this year is down, but not nearly as much as I would have expected. Maybe companies are anticipating the beginnings of a recovery. The mood is definitely less pessimistic (less pessimistic is the new optimistic), thinking that the worst is behind us. Let’s hope so.

Runner’s High

Now that I have started distance running, many friends have asked me if I am enjoying a “runner’s high”, that burst of endorphins that comes from a body’s response to prolonged and inexcusable abuse. I know that my experience with various types of highs is more limited than others (I admit it – I’ve lived a boring life), but I don’t think that any part of running a very long distance can be compared with getting high. But don’t get me wrong – there is pleasure associated with running. In particular, I feel really great when I stop.

That reminds me of an old joke: A man walks into a doctor’s office, raises his arm over his head, and says, “It hurts when I do this.” Doctor: “Then stop doing that.”

But I don’t think I’m confusing a lack of pain for pleasure. The feeling is much more than that. At the end of a long run, where I really wear myself out, once I get my breath back I feel totally and completely relaxed. All the stress of the day or week has escaped the muscles that are now too tired to support it. And if I’m lucky enough to be able to spend the rest of the day on the couch with a cold drink and the Sunday paper, that stressless state can last a long time. As far as I’m concerned, that’s better than any high I can think of.

Tropical Topical Lithography

Two weeks ago (has it been two weeks already?), the 2009 International Workshop on EUV Lithography began on the island of Oahu. Waikiki beach, to be exact. After two days of short courses (I taught one on Tuesday), the two-day workshop began on Wednesday.

By my estimation there were about 50 people in attendance – a very nice size for getting to know people and making connections (I did both). The workshop began with a keynote talk by Sam Sivakumar of Intel. Mostly boilerplate stuff – why EUV lithography is needed, what progress has been made, and where the gaps are. He did mention, though, that Intel’s “15 nm node”, which will have about a 30 nm half-pitch (for the SRAM) and enter high-volume manufacturing in 2013, is still ambiguous as to whether EUV or double patterning will be used. During the question and answer I pressed him on this point, and he admitted (for the first time, as far as I know) that the Intel plan of record for their “15 nm node” will be double patterning, switching “quickly” to EUVL once it is proven more cost effective.

[For the fun of it, let’s render that last statement in the ultimately concise language of corporate technospeak: The current Intel POR for 15nm HVM is DP, not EUVL.]

[Why the “scare quotes” around Intel’s “15 nm node”? With a 30 nm half-pitch, I would call this the 30 nm node. But then, I don’t have a degree in marketing.]

Samsung then gave an even more generic talk on EUV mask readiness (synopsis: not ready). Over a glass of wine later that evening, a Samsung litho engineer gave me the quick answer as to why Samsung is so interested in EUVL. After a thorough economic analysis, Samsung doesn’t believe it can make a profit producing DRAM using double patterning. Thus, without the scaling that an economically viable EUV lithography process would enable, life for the average Samsung lithographer would become (more?) hellish (meaning an unending focus on cost rather than technology). I can’t blame him for working hard to make EUVL successful.

After the keynotes, Hiroo Kinoshita of the University of Hyogo received a Lifetime Achievement Award (plaque plus a >$1000 cash-filled envelope) from the workshop organizers and EUV community. Sometimes described as the “father of EUV lithography”, Kinoshita did the first work and wrote the first paper on EUVL in the mid-1980s while at NEC. I got to know Hiroo a few years ago when he translated my Field Guide to Optical Lithography into Japanese. Thus while I’m quite biased, he’s a great guy, and I was happy to see him receive such acclaim.

The second day of the workshop began with a panel discussion on the status of EUVL R&D. I asked the question about who is doing the fundamental research needed to understand the causes of line-edge roughness (my current topic of interest, as I believe it will prove to be the fundamental limiter to optical lithography resolution). The answers were not encouraging. Later that day there were good papers by the University of Osaka in Japan and Hanyang University in Korea, but I think the answer is that not enough fundamental work on this topic is being done.

In the end, I enjoyed the workshop, and I came away as convinced as ever that Vivek Bakshi will never drive my Lotus.

It is now ten days after the workshop ended, and I am still here in Hawaii. I love the life of a gentleman scientist.

EUV Lithography in Hawaii

I’m back once again in the great state of Hawaii. Like last year, my nominal excuse is to attend the International EUV Lithography Workshop. And while I am still at work writing up my blog post on this topic (it is amazing how quickly I acclimate to island time), here is something to tide the interested reader over. Sally Adee, a journalist with IEEE Spectrum, was at the workshop and has been blogging on what she saw.

http://www.spectrum.ieee.org/blog/semiconductors/devices/tech-talk/i-believe-in-euvl-i-do-i-do

http://www.spectrum.ieee.org/blog/semiconductors/devices/tech-talk/intel-fellow-gunshy-about-euv-future

Wow. Did I really say all that?

Hiroshi Ito

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Last week Hiroshi Ito, co-inventor of the chemically amplified resist (along with C. Grant Willson and Jean Fréchet), passed away after a long illness. Dr. Ito was working as a post-doc under Grant Willson at IBM when they developed the concept and the first example of a chemically amplified photoresist in 1980, now the dominant technology for semiconductor manufacturing. Dr. Ito became an IBM fellow in 2008.

Science, Politics, and Graduation

Last Saturday I attended commencement ceremonies at my alma mater, Rose-Hulman Institute of Technology, a small science and engineering college in Terre Haute, Indiana. It is the first time I have sat through a graduation ceremony at Rose since my own graduation way back in 1982. It was a bit different this time, seeing it from the outside, so to speak. The graduating class of ‘09 was quite a bit bigger than in ’82, and as a result the ceremony quite a bit longer. The commencement speaker was a bit different as well.

I don’t remember the name of the guy who spoke at my college graduation, but I know why he was chosen. He was a Rose grad whose most famous contribution to the engineering profession was the invention of the 2 liter plastic soda bottle. And he spoke about what he knew – how he invented the process for making those bottles. Inspiring.

This year was a little different. The national reputation of Rose-Hulman has grown in the past 27 years, in large part due to ten years of being ranked #1 by US News and World Report in its category (engineering schools that don’t offer PhDs). As a result, the prominence of commencement speakers has also grown, with the governor of Indiana, Mitch Daniels, Jr., giving this year’s speech.

It started off as exactly the kind of commencement address one would expect, with humorous anecdotes, praise for Rose and its graduates, and calls for citizenship. But a politician with a large audience is sorely tempted, and the governor finished with a 15 minute tirade against the global warming “conspiracy”. Calling climate scientists “theologians” and their belief in global warming “a religion”, he lambasted them as graduates of “PC University” who refused to listen to honest skeptics like himself. Quoting the noted climate authority Michael Crichton (he wrote a novel on the subject, after all), he said “scientific consensus is the last refuge of scoundrels”.

Wow. I guess Governor Daniels thinks that science is too important to be left to the scientists. Fortunately, we have politicians like him to help us make sense of it all (making use, I am sure, of the well-deserved reputation of politicians for the reasoned and determined pursuit of truth regardless of the impact on personal or political gain). I feel cooler already.

March Madness – 1979

For any serious basketball fan, the NCAA tournament of 1979 has to stand out as possibly the best one ever, with the final match arguably the best college basketball game ever played. Indiana State University and Larry Bird went undefeated that season until they were finally bested by Michigan State and Magic Johnson, 75-64. Being that game’s 30 year anniversary, and with Michigan State once again making it to the National Championship, there has been much talk lately of that great contest of March 26, 1979. I’d like to share my recollections, not of the game, but of its aftermath.

Indiana State University (ISU) is located in Terre Haute, a town that is most impressive in being completely unimpressive. So when its equally unimpressive state university began winning basketball games, the town took notice. I was a freshman that year at a small college on the other side of town, Rose-Hulman Institute of Technology. Basketball was the last thing on my mind – surviving my first year of chemistry, physics and calculus consumed all of my mental energy (and most of my sleep). Still, it was hard to escape the basketball excitement that was engulfing the town that spring. When ISU made it to the National Championship game, Terre Haute knew it would be an historic event for the city. A victory parade down Wabash Avenue was planned for the evening after the big game, and my roommates and I decided that studying could wait that night.

We drove into town soon after the ISU loss (I didn’t even watch the game), hearing on the radio that the “victory” parade would go on as planned. The parade went on, but it was anything but “as planned”. We parked a few blocks off the main drag and lined up along Wabash Ave. to watch. Within minutes of the start of the parade, things went completely crazy. The lone police car in the parade was soon covered with people and the cop inside wisely fled the scene as his car bobbed up and down under the feet of a dozen people jumping in unison. Street signs and traffic lights started toppling and windows started breaking. A bonfire was lit in the middle of the road as a van from the local radio station blared rock music to the crowd. I was witnessing a full-fledged riot.

My friends and I were in complete disbelief (none of us were serious basketball fans, so we didn’t get what all the fuss was about). As at the scene of an accident, however, we couldn’t turn away. I noticed people breaking into a bar on the corner. Like an especially virulent virus, word of free liquor spread quickly and a huge crowd began to form at the bar. I then witnessed a truly amazing scene. Self-appointed bouncers soon appeared at the entrances, deciding who would be allowed to enter and who would not. When turned away, the less fortunate revealers meekly accepted their status as not being part of the “in” crowd and moved on. I watched this for more than half an hour as impromptu class divisions and a “first-come-first-stolen” hierarchy spontaneously developed. Even in the middle of a riot, society must have its rules.

It seemed like I watched my first riot for at least two hours, though it is quite possible that my sense of time was completely distorted by the strangeness of the events. I then watched how a riot ends, at least in small-town Indiana. I didn’t see them drive up, park, or get out of their cars and vans. I didn’t notice them getting into formation. I just saw as they finally approached the riotous crowd on Wabash Avenue: a neat row of 15 or 20 state police officers, each holding a snarling German Sheppard on a tight leash. They moved slowly up the street like a wall of fleshy teeth, and the crowd simply melted away. As fast as the riot started, it was over. I guess when the purpose of your mass destruction is the loss of a basketball dream, it doesn’t seem worth tangling with a vicious animal over.

So there you have it – my first riot. I too quickly left the scene when the dogs arrived. Is this how most towns deal with the loss of a major sporting event? I don’t think so. I guess Terre Haute is a special place after all.

Capital 10K

It is funny how arbitrary numbers (usually round ones) can take on undue significance in a sport like running. When I began running half marathons, I became fixated on the goal of finishing in less than 2 hours. While the number is arbitrary (would my performance have been a failure if I’d have run the race in 2 hours and 10 seconds?), setting a goal and striving for it is an extremely valuable motivational tool that keeps me pushing and, ultimately, succeeding.

Now that half-marathon season is over, I decided to run in the Capital 10K race in Austin on March 29. But what goal to set? My first race ever was a 10K last August, and my time was a disappointing 64 minutes (granted, it was my first race and it was 95 F at the start of the race). My best 10K split during a half marathon was 55 minutes, so I decided that a goal of 50 minutes made sense. That would mean that I would have to trim my half-marathon pace of 9 minutes/mile by about 1 min/mile – not an easy task.

With the goal set, I began to train for that goal. Then, my father-in-law had to make his opinion known (something he is very good at): “You know, anyone over forty should be able to run a 10K in their age in minutes.” I was perfectly happy with my 50 minute goal, but this new challenge kept haunting me: I would need to run the race in 48:54 min (yes, I counted the days/seconds). Only about a 1 minute difference, but that can mean a lot when you are running at your limits.

So on race day, I ended up with two goals, the “official” one and the more aggressive one that I couldn’t get out of my mind. The final result? I finished the race in 49:42, for a pace of exactly 8:00 min/mile. I was very happy with the result (after all, it was a 15 minute improvement over my last 10K), though I didn’t meet the “run the race in your age” goal. Maybe next year.