Thanks to the rapid pace of Moore’s Law, it has always been hard to visualize the future of semiconductor lithography more than a few generations out. But it seems that my future vision is more cloudy than normal of late. Still, it is fun, and occasionally useful, to defy Niels Bohr (and Yogi Berra) and try to make the most difficult kind of predictions: those that are about the future.

I’ve recent published an editorial on my vision of what the future looks like for semiconductor lithography. In a word: up. To read the editorial, in the Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3), here is the link:

http://nanolithography.spiedigitallibrary.org/article.aspx?articleid=1725896